X-Ray Masks, Electron Beam Projection Masks, Photo Mask

NTT-AT has accumulated various key technologies for the development and production of ultra fine patterning products. These technologies have been cultivated through the development of X-ray mask, one of the key components for X-ray lithography which has been the key lithography method for a long time as part of the next generation LSI production. Electron Beam Projection Masks are a stencil mask using ultra thin SiC membranes.

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•X-Ray Masks, Electron Beam Projection Masks, Photo Masks Datasheet

NTT-AT has accumulated various key technologies for the development and production of ultra fine patterning products. These technologies have been cultivated through the development of X-ray mask, one of the key components for X-ray lithography which has been the key lithography method for a long time as part of the next generation LSI production.

Electron Beam Projection Masks are a stencil mask using ultra thin SiC membranes.

Features

• Able to replicate small patterns (pattern feature size : smaller than 0.1µm)
• Achieving highly precise pattern position accuracy due to SiC membranes

Click Here To Download:
•X-Ray Masks, Electron Beam Projection Masks, Photo Masks Datasheet

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