Datasheet
X-Ray Masks, Electron Beam Projection Masks, Photo Masks Datasheet
NTT-AT has accumulated various key technologies for the development and production of ultra fine patterning products. These technologies have been cultivated through the development of X-ray mask, one of the key components for X-ray lithography which has been the key lithography method for a long time as part of the next generation LSI production. Electron Beam Projection Masks are a stencil mask using ultra thin SiC membranes.
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