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12.19.11 -- MIT: Streamlining Chip Design

December 19, 2011

Semiconductor Online Newsletter

Industry News
MIT: Streamlining Chip Design
SRC And Cornell University Advance On-Chip Silicon Development For Smaller, Mobile Electronic Devices
Trench-Based Low Forward Voltage Schottky Rectifiers Deliver Improved Switching Efficiency
Dialog Semiconductor Wins GSA Outstanding European Company Award For Third Consecutive Year
Industry's First 5 kV rms Signal-Only Isolated CAN Transceiver Rated To 125°C
IDT Introduces Timing Solution For Intel's Romley Server Platform
Integrated Solution For Component-To-System Thermal Characterization And Analysis
TSI Launches New Website
BizLink Technology Joins Analogix' SlimPort Accessories Adopters Program
Ultra-Low-Voltage Operation Of SRAM Down To ∼0.4V Demonstrated
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Featured Download
Tech Brief: Improved Semiconductor Wafer Cleaning By Using Dissolved Gas Control
New processes for wet cleaning semiconductor surfaces have recently been developed. This cleaning process uses dissolved gasses and megasonic irradiation to remove particles, metals, and organics from the surface of semiconductors.
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Conical Structure Nano Pattern Array (Moth-Eye Structure For Anti-Reflection)
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