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Rudolph Technologies, a worldwide leader in the design, development, manufacture and support of high-performance process control metrology systems used by semiconductor device companies, today announced that it has shipped six 300 mm tools to a major European chipmaker. The shipments included one 300 mm aluminum MetaPULSE tool, and five S-300 transparent tools. All of the tools are designed for use in a fully automated fab.

"We are truly encouraged by the fact that our leading edge technology continues to grant us competitive wins in both transparent and opaque thin film applications," commented Ajay Khanna, Director of International Sales at Rudolph Technologies. "This major European chipmaker has been a Rudolph 200 mm customer for many years, and is pleased with the increased efficiency that our 300 mm products offer. Our productRudolph's tools were chosen over those of our competition, clearly demonstrating the success of our program to develop and deliver advanced technology tools and processes designed to meet the long-term metrology requirements outlined in the International Technology Roadmap for Semiconductors (ITRS)."

As of September 30, 2001, a total of 31 customers had purchased Rudolph's MetaPULSE tools in order to meet aluminum and copper metrology needs for leading edge devices. The Company's patented PULSE Technology uses a non-contact, non-destructive technique based on laser induced ultrasound to enable manufacturers to improve their yields and control the new process challenges presented by copper metalization. In addition, Rudolph had a total of 34 customers who purchased their new laser ellipsometry tools that provide for higher repeatability at higher throughput in critical ultra-thin transparent film process control applications.

About Rudolph Technologies
Rudolph is a worldwide leader in the design, development, manufacture and support of high-performance process control metrology systems used by semiconductor device manufacturers. The Company provides a full-fab solution through its families of proprietary systems for both transparent and opaque thin film measurement. Rudolph's product development has successfully anticipated and addressed many emerging trends that are driving the semiconductor industry's growth. The Company's success in creating complementary metrology applications through aggressive research and development is key to Rudolph's strategy for continued technological and market leadership.

This press release contains forward-looking statements. Actual results may differ materially from those projected due to a number of risks, including the impact of the slowdown in the overall economy and the uncertainty of the current global political environment following the recent terrorist attacks, changes in customer demands for our existing and new products, the timing, cancellation or delay of customer orders and shipments and the timing of revenue recognition of shipments, new product offerings from our competitors, changes in or an inability to execute Rudolph Technologies' business strategy, unanticipated manufacturing or supply problems, and changes in tax rules. Rudolph Technologies cannot guarantee future results, levels of activity, performance or achievements. The matters discussed in this press release also involve risks and uncertainties summarized under the heading "Risk Factors" in Rudolph Technologies' Form 10K filed for the year ended December 31, 2000. These factors are updated from time to time through the filing of reports and registration statements with the Securities and Exchange Commission. Rudolph Technologies does not assume any obligation to update the forward-looking information contained in this press release.

Source: Rudolph Technologies, Inc.