Articles
Rudolph Technologies Announces Metrology System For Next-Generation Processes
July 19, 2006
"We developed a hybrid metrology solution to help our customers minimize the equipment, time, and costs needed for thin-film process control," said Robert Loiterman, senior vice president and general manager of the Metrology Business Unit at Rudolph Technologies. "Synergy MPX allows us to extend our opaque film metrology measurements down into the ultrathin film regime that will be required at the 65 nanometer technology node and below."
PULSE Technology, which is currently used for production monitoring in over 200 installations worldwide, is a picosecond ultrasonic laser sonar technique that provides non-contact, non-destructive opaque film measurements for films ranging from 40 angstroms to 6 micrometers. MMXRF is a metrology technology designed specifically for ultrathin film thickness measurements—the monochromatic source eliminates virtually all of the background radiation associated with conventional polychromatic XRF technologies, providing dramatically improved signal-to-noise ratios for accurate and repeatable measurements of sub-nanometer films. The microspot permits measurements in scribe line test structures on product wafers.
"Our Synergy Metrology approach allows our customers to mix and match metrology technologies to meet their evolving requirements," Loiterman continued. "Rudolph's commitment to the Synergy Metrology program will continue as it researches additional hybrid metrology tools as new customer needs are identified."
The Synergy MPX System will be available for shipment in Q4 2006.
SOURCE: Rudolph Technologies
