Articles
Applied Materials Introduces New Vacuum Pumping Solution For Semiconductor Fabs
December 18, 2009
Applied Materials, Inc. unveiled its Applied iSYS platform.
The company said the system is an integrated abatement and vacuum pumping solution for controlling emissions in the semiconductor fab. Networked with an Applied process tool, the company noted the iSYS system can deliver typical annual savings in power, water and gas consumption equivalent to 200MWh of energy or 220,000 pounds of CO2 emissions, compared to currently available configurations.
"With the iSYS platform Applied is capitalizing on its unmatched equipment automation and process tool technology to create a smart solution for decreasing waste in semiconductor manufacturing," said Charlie Pappis, vice president and general manager of Applied Global Services. "By modulating resource consumption in response to changing tool conditions, the iSYS platform can help our customers lower their operating costs and support sustainable manufacturing practices."
Applied Materials is a Nanomanufacturing technology solutions provider with a portfolio of equipment, service and software products for the fabrication of semiconductor chips, flat panel displays, solar photovoltaic cells, electronics and energy efficient glass.
SOURCE: Applied Materials, Inc.
